Extreme Ultraviolet Lithography: Towards the Next Generation of Integrated Circuits
Optics & Photonics Focus
Volume 7 Story 4 - 4/11/2009

ASML Alpha Demo Tool

The sketch represents a developmental full-field EUVL scanner recently developed by ASML. The UV light source (based on a discharge-produced plasma DPP) is placed on the left. The generated UV light is directed by a series of Bragg mirrors to the reflective mask used to pattern the resist (on the right). The entire tool is kept in vacuum conditions to prevent the absorption of the UV light by the air.
[read full story]

ASML Alpha Demo Tool. The sketch represents a developmental full-field EUVL scanner recently developed by ASML. The UV light source (based on a discharge-produced plasma DPP) is placed on the left. The generated UV light is directed by a series of Bragg mirrors to the reflective mask used to pattern the resist (on the right). The entire tool is kept in vacuum conditions to prevent the absorption of the UV light by the air.